SiEPIC Ebeam SiN Layer Configuration Query

[Aydin1992]

I'm using SiEPIC Ebeam technology for designing a SiN-based photonic circuit. I noticed that the SiN is defined on layer 1 and datatype 5 instead of layer 1 and datatype 0. Is there a specific reason for this? Could it be intended as an assistant (non-fabrication) layer?

[lukasc-ubc]

Using separate layers for different fabrication steps is important so that there is no confusion. So we chose 1/0 for Si and 1/5 for SiN.

[Aydin1992]

Thank you for your prompt reply.
The ANT design center can't recognize this layer, showing zero data because all polygons on layer 1 have a data type of 5. If I switch the layer to Silicon (1/0) but keep the shapes the same, would that fix the problem?

[mustafacc]

Yes I believe it should - ANT SiN NanoSOI uses the same layer for Si and SiN.

[lukasc-ubc]

You could also ask ANT to use a different layer number for different materials. You can also remap the layers

[lukasc-ubc]

The PDK has been updated to use layer 4/0, which ANT has agreed to use for SiN fabrication.