Beamline fixes 4

src/main/java/gtnhlanth/common/beamline/BeamLinePacket.java

@@ -16,9 +16,7 @@ public BeamLinePacket(NBTTagCompound compound) {
 
     @Override
     protected BeamInformation contentFromNBT(NBTTagCompound nbt) {
-        /*
-         * NBTTagCompound compound = nbt.getCompoundTag("beamline");
-         */
+
         return new BeamInformation(
             nbt.getFloat("energy"),
             nbt.getInteger("rate"),

src/main/java/gtnhlanth/common/item/ItemPhotolithographicMask.java

@@ -23,16 +23,17 @@ public ItemPhotolithographicMask(String name, int maxDamage, String descSpectrum
         this.setTextureName(Tags.MODID + ":photomask/" + name);
     }
 
-    /*
-     * @Override public String getUnlocalizedName() { return "item.photomask." + this.name; }
-     */
     @SuppressWarnings({ "rawtypes", "unchecked" })
     @Override
     public void addInformation(ItemStack stack, EntityPlayer player, List list, boolean bool) {
 
         if (!this.descSpectrum.isEmpty())
             list.add("Suitable for the " + this.descSpectrum + " segment of the electromagnetic spectrum and lower");
 
+        if (this.getMaxDamage() > 0) // Not a precursor.
+            list.add("Max Uses: " + (this.getMaxDamage() + 1)); // maximum uses = max damage + 1 in general, as
+                                                                // 0-durability masks still function
+
     }
 
     public String getDescSpectrum() {

src/main/java/gtnhlanth/common/item/MaskList.java

@@ -13,60 +13,94 @@ public enum MaskList {
     // Use Dyes._NULL to indicate a wafer's lack of a dedicated lens instead of null, if the wafer's mask is to be
     // generated
     // Ignore last argument if using all wafers
-    ERROR("error", "ERROR", 0, "", null, null, 0, 0, 0, 0, 0, null),
-    BLANK1("blank1", "T1 Blank", 0, "VISIBLE", null, null, 0, 0, 0, 0, 0, null),
-    BLANK2("blank2", "T2 Blank", 0, "UV", null, null, 0, 0, 0, 0, 0, null),
-    BLANK3("blank3", "T3 Blank", 0, "X-RAY", null, null, 0, 0, 0, 0, 0, null),
+    // tcTargetItem specifies the target item used for non-wafer mask+TC recipes, e.g. crystal chips, set to null for
+    // wafer masks
+    ERROR("error", "ERROR", 0, "", null, null, 0, 0, 0, 0, 0, null, null),
+    BLANK1("blank1", "T1 Blank", 0, "VISIBLE", null, null, 0, 0, 0, 0, 0, null, null),
+    BLANK2("blank2", "T2 Blank", 0, "UV", null, null, 0, 0, 0, 0, 0, null, null),
+    BLANK3("blank3", "T3 Blank", 0, "X-RAY", null, null, 0, 0, 0, 0, 0, null, null),
+
+    CBLANK("cblank", "Crystal", 0, "X-RAY", null, null, 0, 0, 0, 0, 0, null, null), // Better at resolving smaller
+                                                                                    // features, in theory
+
     ILC("ilc", "Integrated Logic Circuit", 100, "", BLANK1, Dyes.dyeRed, TierEU.RECIPE_MV, 0.5e-3f, 4e-3f, 35, 1,
-        ItemList.Circuit_Wafer_ILC.get(1)),
+        ItemList.Circuit_Wafer_ILC.get(1), null),
     RAM("ram", "Random Access Memory", 200, "", BLANK1, Dyes.dyeCyan, TierEU.RECIPE_MV, 2e-3f, 4e-3f, 40, 2,
-        ItemList.Circuit_Wafer_Ram.get(1), ItemList.Circuit_Silicon_Wafer),
+        ItemList.Circuit_Wafer_Ram.get(1), null, ItemList.Circuit_Silicon_Wafer),
     NAND("nand", "NAND", 200, "", BLANK2, Dyes._NULL, TierEU.RECIPE_HV, 7e-3f, 12e-3f, 40, 1,
-        ItemList.Circuit_Wafer_NAND.get(1), ItemList.Circuit_Silicon_Wafer), // NAND uses only Ender Pearl lens, don't
-                                                                             // ask me why
-    NOR("nor", "NOR", 100, "", BLANK2, Dyes._NULL, TierEU.RECIPE_LuV, 8e-3f, 10e-3f, 40, 1,
-        ItemList.Circuit_Wafer_NOR.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2), // Same as
-                                                                                                             // above,
-                                                                                                             // but with
-                                                                                                             // ender
-                                                                                                             // eye
+        ItemList.Circuit_Wafer_NAND.get(1), null, ItemList.Circuit_Silicon_Wafer), // NAND uses only Ender Pearl lens,
+                                                                                   // don't
+    // ask me why
+    NOR("nor", "NOR", 100, "", BLANK2, Dyes._NULL, TierEU.RECIPE_HV, 8e-3f, 10e-3f, 40, 1,
+        ItemList.Circuit_Wafer_NOR.get(1), null, ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2), // Same
+                                                                                                                   // as
+    // above,
+    // but with
+    // ender
+    // eye
     CPU("cpu", "Central Processing Unit", 10, "", BLANK2, Dyes.dyeWhite, TierEU.RECIPE_MV, 6e-3f, 12e-3f, 45, 2,
-        ItemList.Circuit_Wafer_CPU.get(1)),
+        ItemList.Circuit_Wafer_CPU.get(1), null),
+    PrCPU("prcpu", "Prepared Central Processing Unit", 0, "", CPU, null, TierEU.RECIPE_EV, 0, 0, 0, 0, null, null),
+
     SOC("soc", "SoC", 150, "", BLANK2, Dyes.dyeYellow, TierEU.RECIPE_EV, 3e-3f, 10e-3f, 45, 2,
-        ItemList.Circuit_Wafer_SoC.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2),
+        ItemList.Circuit_Wafer_SoC.get(1), null, ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2),
     ASOC("asoc", "Advanced SoC", 120, "", BLANK2, Dyes.dyeGreen, TierEU.RECIPE_EV, 100e-3f, 200e-3f, 50, 2,
-        ItemList.Circuit_Wafer_SoC2.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2),
+        ItemList.Circuit_Wafer_SoC2.get(1), null, ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2),
+
     PIC("pic", "Power IC", 100, "", BLANK2, Dyes.dyeBlue, TierEU.RECIPE_HV, 5e-3f, 10e-3f, 50, 4,
-        ItemList.Circuit_Wafer_PIC.get(1), ItemList.Circuit_Silicon_Wafer),
-    HPIC("hpic", "High Power IC", 80, "", BLANK3, null, TierEU.RECIPE_IV, 100e-3f, 200e-3f, 50, 6,
-        ItemList.Circuit_Wafer_HPIC.get(1), ItemList.Circuit_Silicon_Wafer), // Different, made in chemical reactor.
-                                                                             // Figure out something for
-    // this later?
-    NCPU("ncpu", "NanoCPU", 60, "", BLANK2, null, TierEU.RECIPE_EV, 5e-3f, 10e-3f, 50, 4,
-        ItemList.Circuit_Wafer_NanoCPU.get(1), ItemList.Circuit_Silicon_Wafer), // Same as above
-    QBIT("qbit", "QBit", 50, "", BLANK2, null, TierEU.RECIPE_EV, 3e-3f, 10e-3f, 50, 4,
-        ItemList.Circuit_Wafer_QuantumCPU.get(1), ItemList.Circuit_Silicon_Wafer), // ^
-    UHPIC("uhpic", "Ultra High Power IC", 60, "", BLANK3, null, TierEU.RECIPE_LuV, 200e-3f, 400e-3f, 50, 8,
-        ItemList.Circuit_Wafer_UHPIC.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2), // You
-                                                                                                               // get
-                                                                                                               // the
-                                                                                                               // gist
+        ItemList.Circuit_Wafer_PIC.get(1), null, ItemList.Circuit_Silicon_Wafer),
+    PrPIC("prpic", "Prepared Power IC", 0, "", PIC, null, TierEU.RECIPE_IV, 0, 0, 0, 0, null, null), // Made in CR from
+                                                                                                     // PIC
+
+    HPIC("hpic", "High Power IC", 80, "", PrPIC, Dyes.dyeBlue, TierEU.RECIPE_IV, 100e-3f, 200e-3f, 50, 6,
+        ItemList.Circuit_Wafer_HPIC.get(1), null, ItemList.Circuit_Silicon_Wafer),
+    PrHPIC("prhpic", "Prepared High Power IC", 0, "", HPIC, null, TierEU.RECIPE_LuV, 0, 0, 0, 0, null, null), // Made in
+                                                                                                              // CR from
+                                                                                                              // HPIC
+
+    NCPU("ncpu", "NanoCPU", 60, "", PrCPU, Dyes.dyeWhite, TierEU.RECIPE_EV, 5e-3f, 10e-3f, 50, 4,
+        ItemList.Circuit_Wafer_NanoCPU.get(1), null, ItemList.Circuit_Silicon_Wafer),
+    PrNCPU("prncpu", "Prepared NanoCPU", 0, "", NCPU, null, TierEU.RECIPE_EV, 0, 0, 0, 0, null, null),
+
+    QBIT("qbit", "QBit", 50, "", PrNCPU, Dyes.dyeWhite, TierEU.RECIPE_EV, 3e-3f, 10e-3f, 50, 4,
+        ItemList.Circuit_Wafer_QuantumCPU.get(1), null, ItemList.Circuit_Silicon_Wafer), // ^
+    UHPIC("uhpic", "Ultra High Power IC", 60, "", PrHPIC, Dyes.dyeBlue, TierEU.RECIPE_LuV, 190e-3f, 400e-3f, 50, 8,
+        ItemList.Circuit_Wafer_UHPIC.get(1), null, ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2),
     SSOC("ssoc", "Simple SoC", 150, "", BLANK1, Dyes.dyeOrange, TierEU.RECIPE_MV, 2e-3f, 4e-3f, 25, 1,
-        ItemList.Circuit_Wafer_Simple_SoC.get(1)),
+        ItemList.Circuit_Wafer_Simple_SoC.get(1), null),
     ULPIC("ulpic", "Ultra Low Power IC", 200, "", BLANK1, Dyes.dyeGreen, TierEU.RECIPE_LV, 2e-3f, 4e-3f, 30, 1,
-        ItemList.Circuit_Wafer_ULPIC.get(1)), // Can use green for this as well as asoc, given
+        ItemList.Circuit_Wafer_ULPIC.get(1), null), // Can use green for this as well as asoc, given
     // the latter uses a different base mask
     LPIC("lpic", "Low Power IC", 150, "", BLANK1, Dyes.dyeYellow, TierEU.RECIPE_MV, 2e-3f, 4e-3f, 30, 2,
-        ItemList.Circuit_Wafer_LPIC.get(1)), // Same as above, except for yellow
-    NPIC("npic", "Nano Power IC", 70, "", BLANK3, Dyes.dyeRed, TierEU.RECIPE_LuV, 1, 3000, 50, 4,
-        ItemList.Circuit_Wafer_NPIC.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2,
+        ItemList.Circuit_Wafer_LPIC.get(1), null), // Same as above, except for yellow
+
+    NPIC("npic", "Nano Power IC", 70, "", BLANK2, Dyes.dyeRed, TierEU.RECIPE_LuV, 1, 4, 50, 4,
+        ItemList.Circuit_Wafer_NPIC.get(1), null, ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2,
         ItemList.Circuit_Silicon_Wafer3), // Same
-    PPIC("ppic", "PPIC", 50, "", BLANK3, null, TierEU.RECIPE_ZPM, 1.5f, 10, 50, 6, ItemList.Circuit_Wafer_PPIC.get(1),
-        ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2, ItemList.Circuit_Silicon_Wafer3), // CR
-                                                                                                           // recipe
-    QPIC("qpic", "QPIC", 50, "", BLANK3, Dyes.dyeBlue, TierEU.RECIPE_UV, 5, 9, 50, 6,
-        ItemList.Circuit_Wafer_QPIC.get(1), ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2,
-        ItemList.Circuit_Silicon_Wafer3, ItemList.Circuit_Silicon_Wafer4); // Different base mask to PIC
+    PrNPIC("prnpic", "Prepared Nano Power IC", 0, "", NPIC, null, TierEU.RECIPE_ZPM, 0, 0, 0, 0, null, null), // Made in
+                                                                                                              // CR from
+                                                                                                              // NPIC
+
+    PPIC("ppic", "PPIC", 50, "", PrNPIC, Dyes.dyeRed, TierEU.RECIPE_ZPM, 1.5f, 10, 50, 6,
+        ItemList.Circuit_Wafer_PPIC.get(1), null, ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2,
+        ItemList.Circuit_Silicon_Wafer3),
+
+    QPIC("qpic", "QPIC", 50, "", BLANK3, Dyes.dyeBlue, TierEU.RECIPE_UV, 3.2f, 9, 50, 6,
+        ItemList.Circuit_Wafer_QPIC.get(1), null, ItemList.Circuit_Silicon_Wafer, ItemList.Circuit_Silicon_Wafer2,
+        ItemList.Circuit_Silicon_Wafer3, ItemList.Circuit_Silicon_Wafer4), // Different base mask to PIC
+
+    CCPU("ccpu", "Crystal Central Processing Unit", 100, "", CBLANK, Dyes.dyeGreen, 10_000, 1, 3, 50, 6,
+        ItemList.Circuit_Chip_CrystalCPU.get(1), ItemList.Circuit_Parts_Crystal_Chip_Elite.get(1)), // For producing
+                                                                                                    // Crystal CPUs from
+                                                                                                    // Engraved CCs
+    CSOC("csoc", "Crystal SoC", 100, "", CBLANK, Dyes.dyeBlue, 40_000, 2, 7, 50, 8,
+        ItemList.Circuit_Chip_CrystalSoC.get(1), ItemList.Circuit_Chip_CrystalCPU.get(1)),
+    ACC("acc", "Advanced Crystal Chip", 100, "", CBLANK, Dyes.dyeLime, 80_000, 3, 9, 55, 12,
+        ItemList.Circuit_Chip_CrystalSoC2.get(1), ItemList.Circuit_Chip_CrystalSoC.get(1)),
+    LCC("lcc", "Living Crystal Chip", 75, "", CBLANK, Dyes.dyeWhite, 160_000, 5, 12, 60, 16,
+        ItemList.Circuit_Parts_Crystal_Chip_Wetware.get(1), ItemList.Circuit_Chip_CrystalSoC2.get(1))
+
+    ;
 
     String name;
     String englishName;
@@ -85,24 +119,27 @@ public enum MaskList {
     float minFocus;
     int baselineAmount;
 
+    ItemStack tcTargetItem;
     ItemStack producedItem;
 
     ItemList[] forbiddenWafers;
 
-    MaskList(String name, String englishName, int maxDamage, String spectrum, MaskList precursor, Dyes lensColour,
+    MaskList(String name, String englishName, int maxUses, String spectrum, MaskList precursor, Dyes lensColour,
         long engraverEUt, float minEnergy, float maxEnergy, float minFocus, int baselineAmount, ItemStack producedItem,
-        ItemList... forbiddenWafers) {
+        ItemStack tcTargetItem, ItemList... forbiddenWafers) {
         this.name = name;
         this.englishName = englishName;
         this.spectrum = spectrum;
-        this.maxDamage = maxDamage;
+        this.maxDamage = maxUses - 1; // 0-durability masks still function, so e.g. maxUses = 100 corresponds to
+                                      // durability levels 0-99
         this.precursor = precursor;
         this.lensColour = lensColour;
         this.engraverEUt = engraverEUt;
         this.minFocus = minFocus;
         this.minEnergy = minEnergy;
         this.maxEnergy = maxEnergy;
         this.baselineAmount = baselineAmount;
+        this.tcTargetItem = tcTargetItem;
         this.producedItem = producedItem;
         this.forbiddenWafers = forbiddenWafers;
     }
@@ -151,6 +188,10 @@ public int getBaselineAmount() {
         return this.baselineAmount;
     }
 
+    public ItemStack getTCTargetItem() {
+        return this.tcTargetItem;
+    }
+
     public ItemStack getProducedItem() {
         return this.producedItem;
     }

src/main/java/gtnhlanth/common/register/LanthItemList.java

@@ -70,7 +70,6 @@ public final class LanthItemList {
 
     public static final Block COOLANT_DELIVERY_CASING = new BlockCasing("coolant_delivery");
 
-    // public static final Block ANTENNA_CASING_T1 = new Casing("antenna_t1");
     public static final Block ANTENNA_CASING_T1 = new BlockAntennaCasing(1);
     public static final Block ANTENNA_CASING_T2 = new BlockAntennaCasing(2);
 

src/main/java/gtnhlanth/common/register/WerkstoffMaterialPool.java

@@ -1945,7 +1945,7 @@ public class WerkstoffMaterialPool implements Runnable {
         new short[] { 0, 0, 0 },
         "Reactive-Ion Etching Mixture",
         subscriptNumbers("CHF3/O2"),
-        new Werkstoff.Stats().setCentrifuge(true),
+        new Werkstoff.Stats(),
         Werkstoff.Types.MIXTURE,
         new Werkstoff.GenerationFeatures().disable()
             .addCells(),
@@ -2015,14 +2015,22 @@ public class WerkstoffMaterialPool implements Runnable {
         offsetID3b + 10,
         TextureSet.SET_FLUID);
 
+    public static final Werkstoff HotSuperCoolant = new Werkstoff(
+        new short[] { 155, 17, 30 },
+        "Hot Super Coolant",
+        new Werkstoff.Stats(),
+        Werkstoff.Types.MIXTURE,
+        new Werkstoff.GenerationFeatures().disable()
+            .addCells(),
+        offsetID3b + 11,
+        TextureSet.SET_FLUID);
+
     public static void runInit() {
         addSubTags();
     }
 
     private static void addSubTags() {
 
-        // WerkstoffMaterialPool.PTMEGElastomer.add(SubTag.BOUNCY, SubTag.STRETCHY);
-
     }
 
     @Override